Nanometer-Scale Molecular Rods Nowick, J. S.; Gothard, C. M. Presented at the 229thNational Meeting of the American Chemical Society, San Diego, CA, March 2005;paper ORG 732.Abstract: This paper introduces the unnatural amino acid, 4-amino-[1,1-biphe
Regular Array of Nanometer-Scale Devices Performing Logic Operations with Fault-Tolerance Capability Alexandre Schmid and Yusuf Leblebici Microelectronic Systems Laboratory, Swiss Federal Institute of Technology, CH-1015 Lausanne, Switzerland Abstrac
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Infrared Imaging of the Nanometer-ThickAccumulation Layer in OrganicField-Effect TransistorsZ. Q. Li,*,G. M. Wang,N. Sai,D. Moses,M. C. Martin,M. Di Ventra,A. J. Heeger,and D. N. BasovDepartment of Physics, UniVersity of California, San Diego,La Joll
Short communicationNucleation of nanometer-scale electrocatalystparticles in solid oxide fuel cell anodesB.D. Madsen, W. Kobsiriphat, Y. Wang, L.D. Marks, S.A. BarnettNorthwestern University, Materials Science and Engineering Department, 2220 Campus
06-26 Media Contact: Eleanor Taylor (630) 252-5565 etaylor@anl.gov FOR IMMEDIATE RELEASE New technique breaks nanometer barrier in X-ray microscopyARGONNE, Ill. (Nov. 9, 2006) A new X-ray microscopy technique that observes molecular-scale features le
Leakage Aware Design of Nanometer CMOS CircuitsOne-day intensive course 29 March, 2007, Budapest, Hungary Budapest University of Technology and Economics, Department of Electronics Technology This course is the fourth one in a series of Leakage Aware
Fabrication of Nanometer Sized Features on Non-Flat Substrates Using a Nano-Imprint Lithography Process Mike Miller, Gary Doyle, Nick Stacey, Frank Xu, S.V. Sreenivasan, Mike Watts and Dwayne L. LaBrake Molecular Imprints, Inc.1807-C West Braker Lane

